PhD Studentship in Focused Electron Beam-Induced Deposition of Semiconductors

This PhD is funded by the Department of Materials; tuition fees will be covered and a tax free stipend will be given based on the UKRI rate (£18,622 for 2023/24). We are seeking a highly motivated and talented candidate to pursue a PhD in this exciting area of Focused Electron beam-induced deposition (FEBID) of Semiconductors. This is aligned to the award of £1.7M from EPSRC for direct addicitve manufacturing of semiconductor nanostructures. Focused Electron Beam-Induced Deposition (FEBID) has emerged as a powerful technique for precise nanoscale fabrication. This project focuses specifically on advancing FEBID methods for depositing semiconductors with unprecedented precision, control, and novel material properties. The successful candidate will explore the synthesis, characterization, and applications of semiconductor nanostructures fabricated through FEBID. Key Research Objectives: (i) Investigate and optimize FEBID parameters for depositing semiconductor materials. (ii) Characterize the structural, electronic, and optical properties of FEBID-grown semiconductors at the nanoscale. (iii) Explore novel applications of FEBID-deposited semiconductor nanostructures in electronic and optoelectronic devices. (iv) Develop in situ and ex situ techniques for real-time monitoring and control of FEBID processes. Applicants should have, or expect to achieve, at least a 2.1 honours degree or a master’s (or international equivalent) in a relevant science or engineering related discipline. Before you apply please contact Dr David Lewis: david.lewis-4@manchester.ac.uk